EBALOY SNI黑色錫鎳合金工藝

?

?

EBALOY SNI黑色錫鎳合金電鍍工藝主要設(shè)計(jì)目的是為鎳鍍層添上一層黑色裝飾性表面效果。

1. 一. 工藝特性
2. 由于鍍液穩(wěn)定，所產(chǎn)生色澤也穩(wěn)定；
3. 加強(qiáng)防腐性能；
4. 不需要保護(hù)層，因?yàn)殄a鎳鍍層具有很好的耐磨損能力及防止表面氧化效果；
5. 可用于滾鍍工藝。
6. 二. 鍍液成份及操作條件

范?圍? ?最??佳

SNI錫鹽 g/L 8～15 ? ???????10

SNI鎳水 mL/L 160～240 ?? 200

SNI導(dǎo)電鹽 ????g/L ?150～280 ?? 200

SNC 3號(hào)添加劑 mL/L 10～20 15

陰極電流密度 A/dm²? ? 0.5～2.0 ? 1.0

鍍液溫度 ℃ 45～55 ? 50

電鍍時(shí)間 min. ?1～5 ? 2

pH值 7.0～8.5 ? 7.7

陽(yáng)極? 炭板

陰極陽(yáng)極面積比 1:1～1:2

鍍液攪拌? 陰極移動(dòng)

鍍液過(guò)濾? 連續(xù)過(guò)濾

?

?

1. 三. 溶液配制

EBALOY SNI黑色錫鎳電鍍?nèi)芤菏且耘渲坪玫囊后w提供的，鍍液可立即使用，不用稀釋或調(diào)校。若要添加個(gè)別原料，則必需少量添加及攪拌均勻才可開(kāi)始電鍍。

?

四．電鍍流程

EBALOY SNI黑色錫鎳工藝起到使鎳鍍層表面變成黑色的效果。其流程如下：

鍍鎳?回收?清水洗?水洗?EBALOY SNI錫鎳電鍍?后處理?回收?水洗?水洗?干燥

?

五．設(shè)備

鍍槽? 加強(qiáng)PVC或鋼槽襯膠里

加熱器? 石英或鈦加熱筆

陽(yáng)極? 炭板

攪拌? 陰極移動(dòng)最少1～2m/min

過(guò)濾? 連續(xù)過(guò)濾

?

1. 六. 溶液控制
2. 保持原材料及添加劑濃度

每100Ah各項(xiàng)材料的消耗如下：

SNI錫鹽 g ?140

SNI鎳水 mL ????600

SNI導(dǎo)電鹽 ????g ?125

SNC 3^#添加劑 mL ????30

在實(shí)際生產(chǎn)情況下，大部分損耗來(lái)自帶出損耗，故未固定生產(chǎn)量時(shí)可按上面數(shù)字參考補(bǔ)充。

?

ENLOY^??SHADOW

Electrolytic black nickel process

ENLOY^?陰影

電解黑鎳工藝

ENLOY^??SHADOW is a multiple additive, black nickel process that will produce a decorative black deposit on steel, brass, and copper plated components. The deposits are absolutely uniform. ENLOY SHADOW deposits exhibit excellent corrosion resistance and adhesion. The process offers excellent leveling and throwing power over a wide current density range using cathode rod agitation. PLEASE READ ENTIRE TECHNICAL DATA SHEET BEFORE USING THIS PRODUCT.

ENLOY^?SHADOW是一種多添加劑黑鎳工藝，可在鋼、黃銅和鍍銅部件上產(chǎn)生裝飾性黑色沉積物。沉積物是絕對(duì)均勻的。ENLOY SHADOW沉積物表現(xiàn)出優(yōu)異的耐腐蝕性和附著力。該工藝使用陰極棒攪拌，在寬電流密度范圍內(nèi)提供出色的整平和投擲功率。使用本產(chǎn)品前，請(qǐng)閱讀完整的技術(shù)數(shù)據(jù)表。

?

?

FEATURES AND BENEFITS

功能和優(yōu)點(diǎn)

• ??Excellent Leveling, Good Uniformity, And Ductility ?????? ???Ease And Economy Of Operation Over A Wide Current Density Range
• ???Excellent Corrosion Resistance ????????????????????????????????? ???Deposit Is Corrosion Resistant
• ???Absolutely Uniform Finish ???????????????????????????????????????? ???Virtually Eliminates Rejects
• 良好的平整度、良好的均勻性和延展性 ????????????????????????在寬電流密度范圍內(nèi)操作方便且經(jīng)濟(jì)
• 卓越的耐腐蝕性 ????????????????????????????????????????????????????????沉積物耐腐蝕
• 絕對(duì)均勻的表面處理 ??????????????????????????????????????????????????幾乎消除了不合格品

?

MATERIALS REQUIRED

所需材料

For proper selection and use of system components, consult your Enthone-OMI representative.

如需正確選擇和使用系統(tǒng)組件，請(qǐng)咨詢您的Enthone OMI代表。

1. ?Nickel Chloride (NiCl2 . 6H20), dry or liquid (Product Code Number UH01 or UL01).
2. ?氯化鎳（NiCl2.6H20），干燥或液體（產(chǎn)品代碼UH01或UL01）。

2. ENLOY SHADOW SN (Product Code Number 5382) is used for make up and replenishment.
3. ?ENLOY SHADOW SN（產(chǎn)品代碼5382）用于補(bǔ)充和補(bǔ)充。

3. ENLOY SHADOW NA (Product Code Number 5384) is used for make up and replenishment.
4. ?ENLOY SHADOW NA（產(chǎn)品代碼5384）用于補(bǔ)充和補(bǔ)充。

4. ENLOY SHADOW K (Product Code Number 5383) may be required for make up and replenishment. ?It is used to raise the pH.
5. ?可能需要ENLOY SHADOW K（產(chǎn)品代碼5383）進(jìn)行補(bǔ)充和補(bǔ)貨。它用于提高pH值。

5. ?Hydrochloric Acid (HCl), AR grade, may be required to lower pH.
6. ?可能需要AR級(jí)鹽酸（HCl）來(lái)降低pH值。

6. Deionized or distilled water.
7. 去離子水或蒸餾水。

EQUIPMENT REQUIRED

所需設(shè)備

?

Consult Enthone-OMI Technical Service Representative for design and material ecommendations.

有關(guān)設(shè)計(jì)和材料建議，請(qǐng)咨詢Enthone OMI技術(shù)服務(wù)代表。

Tanks ??? ??PVC or polypropylene or steel tanks lined with these materials.

容器 PVC或聚丙烯或鋼儲(chǔ)罐內(nèi)襯這些材料。

Racks ???? Plating rack coatings, usually PVC, must be approved by Enthone-OMI. ? ?Workpieces must be firmly attached to the racks. If the workpieces are very light, the racks should be correspond- ingly heavier to prevent swinging.

機(jī)架 ????????電鍍機(jī)架涂層，通常為PVC，必須經(jīng)Enthone OMI批準(zhǔn)。工件必須牢固地固定在機(jī)架上。如果工件很輕，支架應(yīng)該相應(yīng)地更重，以防止擺動(dòng)。

Heating/Cooling Immersion heaters made of PTFE, PTFE coils or indirect heating.

加熱/冷卻 ????????????????由PTFE、PTFE線圈或間接加熱制成的浸入式加熱器。

Fittings All fittings should be protected with PVC.

配件 ????????????????????????所有配件均應(yīng)采用聚氯乙烯保護(hù)。

Filtration Filtration will be required after solution make up or precipitation of white ???sludge.

過(guò)濾 ??????????????????白色污泥的溶液補(bǔ)充或沉淀后，需要進(jìn)行過(guò)濾。

Rectifiers ?????????8 volt units; for high output 12 volt units may be necessary. Must have ?capacity to develop necessary direct current, with less than 5% ripple at amperage used. ?Rectifiers must be pro- tected against corrosion from acid fumes or placed away from solution.

整流器 ?????????8伏單元；對(duì)于高輸出，可能需要12伏單元。必須具有開(kāi)發(fā)必要直流電的能力，在使用安培數(shù)時(shí)紋波小于5%。整流器必須進(jìn)行防腐處理，以防受到酸性煙霧的腐蝕，或放置在遠(yuǎn)離溶液的地方。

Anodes/Bags ???? Pure nickel anodes; no S-nickel. ?Anodes must be hung on pure nickel hooks; do not use tita- nium hooks or baskets. ?Anode bags are not necessary.

陽(yáng)極/袋 ?????????????純鎳陽(yáng)極；沒(méi)有S-鎳。陽(yáng)極必須掛在純鎳掛鉤上；不要使用提塔牛鉤或籃子。不需要陽(yáng)極袋。

Ventilation ?? ?Consult the American Conference of Industrial Hygienists book entitled, ? “Industrial Ventilation, A Manual of Recommended Practice.”

通風(fēng)咨詢 ??????????請(qǐng)參閱美國(guó)工業(yè)衛(wèi)生學(xué)家會(huì)議題為“工業(yè)通風(fēng)，推薦操作手冊(cè)”的書(shū)

OPERATING CONDITIONS

操作條件

Rate Of Deposition - Time in seconds to ??????????????ASD ?????????????????ASF ??????????????????Time

沉積速率-時(shí)間（以秒為單位）

deposit 0.1 μm (8 μ inches) average ????????????????????0.3 ??????????????????????3.0 ??????????????????60

沉積物平均0.1μm（8μ英寸）

MAKE-UP PROCEDURE

補(bǔ)給程序

Do not premix components prior to adding to the processing tank. Add the components in the order given. For each 100 gallons (378 liters) of final operating solution, proceed as follows.

在添加到處理罐之前，不要預(yù)混合成分。按照給定的順序添加組件。對(duì)于每100加侖（378升）的最終操作溶液，進(jìn)行如下操作。

1. Heat 33 gallons (125 liters) of deionized or distilled water to 140 °F (60 °C). With continuous stirring, add the required amount of nickel chloride. ?Continue stirring until completely dissolved.
2. 將33加侖（125升）去離子水或蒸餾水加熱至140°F（60°C）。在連續(xù)攪拌的情況下，加入所需量的氯化鎳。繼續(xù)攪拌直至完全溶解。

2. With continuous stirring, add the required amount of ENLOY SHADOW SN. ??It is preferable to dilute the com- ponent with deionized or distilled water and distribute it uniformly over the surface of the solution.

2.在連續(xù)攪拌的情況下，加入所需量的ENLOY SHADOW SN。最好用去離子水或蒸餾水稀釋成分，并將其均勻分布在溶液表面。

3. With continuous stirring, add the required amount of ENLOY SHADOW K. ??It is preferable to dilute the compo- nent with deionized or distilled water and distribute it uniformly over the surface of the solution.

3.在連續(xù)攪拌的情況下，加入所需量的ENLOY SHADOW K。最好用去離子水或蒸餾水稀釋成分，并將其均勻分布在溶液表面。

4. ??Check pH to ensure it has not dropped below 4.0. ?If lower than 4.0, add ENLOY SHADOW K in small incre- ments with continuous stirring until pH reaches 4.5 to 5.0.

4.檢查pH值，確保其沒(méi)有降至4.0以下。如果低于4.0，則在連續(xù)攪拌的情況下少量添加ENLOY SHADOW K，直到pH達(dá)到4.5至5.0。

5. ??With continuous stirring, add the required amount of ENLOY SHADOW NA. ?It is preferable to dilute the com-ponent with deionized or distilled water and distribute it uniformly over the surface of the solution.

5.在連續(xù)攪拌的情況下，加入所需量的ENLOY SHADOW NA-用去離子水或蒸餾水稀釋，并將其均勻分布在溶液表面。

6. Fill to final volume with deionized or distilled water. ?Heat to operating temperature, if required.

6.用去離子水或蒸餾水填充至最終體積。如果需要，加熱至工作溫度。

7. ??Filter for two to three hours. ?The operating solution is now ready for use.

7.過(guò)濾兩到三個(gè)小時(shí)。操作解決方案現(xiàn)在可以使用了。

OPERATION

操作

It is important that the instructions in this Technical Data Sheet are carefully followed. Operation outside the des- ignated ranges could result in defective deposits and plating rejects. Specific gravity, temperature and pH values ?should be controlled daily. The use of automatic dosing pumps is recommended. Small, frequent additions are recommended. In no instance should the amount of replenish addition be more than the make up quantity. When making additions, it is preferable to dilute the component with water or plating solution and distribute it uniformly ??over the surface of the solution.

務(wù)必認(rèn)真遵守本技術(shù)數(shù)據(jù)表中的說(shuō)明。超出指定范圍的操作可能導(dǎo)致有缺陷的沉積物和鍍層不合格。應(yīng)每天控制比重、溫度和pH值。建議使用自動(dòng)加藥泵。建議少量、頻繁添加。在任何情況下，補(bǔ)充添加的數(shù)量都不應(yīng)超過(guò)補(bǔ)充數(shù)量。添加時(shí)，最好用水或電鍍?nèi)芤合♂尦煞郑⑵渚鶆蚍植荚谌芤罕砻妗?/p>

Pre-treatment

預(yù)處理

Prior to plating,the work surface should be pre-treated in a dilute hydrochloric acid (5% HCl) dip.

電鍍前，應(yīng)在稀鹽酸（5%HCl）浸液中對(duì)工作表面進(jìn)行預(yù)處理。

Post Treatment

后處理

?

After plating, an acidic drag out rinse is recommended to avoid precipitation of metal salts. ?The pH of the drag out rinse should be adjusted to 3.0 to 4.0 with hydrochloric acid.

電鍍后，建議進(jìn)行酸性沖洗，以避免金屬鹽沉淀。應(yīng)使用鹽酸將拖出沖洗液的pH值調(diào)節(jié)至3.0至4.0。

Maintenance

維護(hù)

The ENLOY SHADOW operating solution should be analyzed periodically for ENLOY SHADOW SN and ENLOY SHADOW NA and replenished as required. ?Analytical procedures for these two components are available from ?Enthone-OMI.

ENLOY SHADOW操作溶液應(yīng)定期分析ENLOY SHADOW SN和ENLOY SHADOW NA，并根據(jù)需要補(bǔ)充。這兩種成分的分析程序可從Enthone OMI獲得。

OPERATION?(Cont’d)

操作（續(xù)）

?

EBALOY ?SNC ?BLACK ?PROCESS

黑?色?錫?鈷?合?金?電?鍍?工?藝

• 簡(jiǎn)介

EBALOY SNC BLACK是一種裝飾性電鍍工藝，其鍍層具有一種獨(dú)特美麗黑色效果。一般此工藝是在光亮鎳或沙鎳鍍層上鍍成其特別效果。

• 工藝特性
• 具有美麗獨(dú)特之黑色鍍層。
• 鍍液穩(wěn)定性高，鍍層色澤亦較穩(wěn)定。
• 覆蓋能力高，可作滾鍍用。
• 鍍液容易調(diào)校，典型之合金電鍍困難不存在。

• 鍍液配制程序

EBALOY SNC BLACK 鍍液已經(jīng)是可用液，不用稀釋或調(diào)校。

• 標(biāo)準(zhǔn)鍍液成份

SNC錫鹽 10 ?克/升

SNC鈷鹽 30 ?克/升

SNC導(dǎo)電鹽 320 克/升

SNC NO.1添加劑 100 毫升/升

SNC NO.3添加劑 20 ?毫升/升

• 操作流程

錫鈷合金電鍍一般都需要光亮鎳作底層電鍍，其流程如下：

光亮鍍鎳→回收→水洗→水洗→?EBALOY SNC BLACK →回收→水洗→后處理*→回收→水洗→水洗→干燥

*?后處理：主要功用是增加鍍層之防腐能力。

一般可以使用鉻酸浸洗?---?? 鉻酸片 ：50 克/升

浸漬時(shí)間 ：30 秒

溫?度 ：室?溫

本公司出產(chǎn)之ECR-500亦可作為后處理工藝。

• 鍍液控制及補(bǔ)充量

每100安培小時(shí)消耗：

掛?鍍 滾?鍍

SNC 錫鹽 0.20 - 0.25 0.8 - 1.3 公斤

SNC 鈷鹽 0.35 - 0.40 0.9 - 1.5 公斤

SNC 導(dǎo)電鹽 1.0 - 1.5 7.5 - 15 公斤

SNC NO.1添加劑 0.4 - 0.7 3 - 6 升

SNC NO.3添加劑 0.08 - 0.11 0.3 - 0.6 升

補(bǔ)充時(shí)必須小量添加至完全溶解才可再加。

• 標(biāo)準(zhǔn)操作條件

?